The production process of traditional lead silicate glass MCP is complex. This results in the generation of an electron cascade, which is detected at the output (more positive) side of the MCP. When an electron enters the input side of the MCP and strikes the wall of the pore, it can cause secondary electrons to be emitted, which are accelerated along the pore of the MCP, generating further secondary electrons upon impact with the pore walls. Then a MCP operates with a bias applied between the NiCr electrodes on the two planar surfaces generating an electric field of ~10 6 V/m along the pores with a bias angle usually 5° ~ 13° to the normal of the plate surface. The traditional lead silicate glass microchannel plate (LSG-MCP) is fabricated by a sort of processes such as glass fiber drawing, stacking, etching, hydrogen firing, and electrode deposition. The scale-up of MCP-based detectors has been limited by the high cost and limited flexibility of existing MCP fabrication techniques. MCP can be used in many scientific applications, such as microchannel plate photomultipliers (MCP-PMT), night vision devices, electron microscopy, molecular and atomic collision studies, astronomy, and time of flight mass spectrometry. MCP enables excellent timing characteristics at the picosecond level and good spatial resolution at the micrometer level with MCP-based detectors through various readout configurations. Micro-channel plate (MCP) is a two dimensional arrays of microscopic channel electron multipliers. Because of blocking effect the dark current density will drop to 0.03 picoampere in 50 minutes by depositing zinc oxide film with thickness of 4 nm before the SEE layer, and the resistance of MCP will reduce when the thickness of zinc oxide exceeds 4 nm. Meanwhile after the deposition of aluminum oxide film, the dark current density of the microchannel plate would increase to 1.8 picoampere in 15 minutes at DC 1000 V. High gain performance (24000 800 V) can be obtained by depositing only aluminum oxide film on traditional reduced lead glass microchannel plate. For the conduction mechanisms, the I-V curve obeys the ohmic law at low voltage region and the trap-controlled space-charge-limited conduction mechanisms as the applied voltage continue to increase.
After 5 days of continuous loading with 800 V bias, the resistance nearly doubled and stabilized. As the tested voltage increased a behavior of negative temperature coefficient of the film was observed. The bulk resistance of MCP in the suitable range (about 40~100 MΩ) was obtained by adjusting the percentage of zinc oxide (ZnO) cycles and the nano-oxide thin film thickness. In this study, oxide thin films such as zinc oxide doped with aluminum oxide (AZO) as conductive layer and aluminum oxide (Al2O3) as secondary electron emission (SEE) layer were prepared in the pores of MCP via thermal atomic layer deposition (ALD). Microchannel plate (MCP) is two dimensional arrays of microscopic channel electron multipliers.